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[ Focus Center / Processing / Mask Making ]

The MiRC Processing Service Center, located in the Joseph M. Pettit Microelectronics Research Center building, is an integral part of The Platform. Processing Center personnel are able to provide complete silicon CMOS runs from design and multi-step process modules through testing and characterization.

The Service Center also offers individual processing steps separate from CMOS runs as needed by researchers among the Georgia Tech community and around the world. The ability to offer processing modules facilitates research on a variety of new materials, devices and micromechnical systems.

CMOS Runs (Quarterly)

• Process design
• Mask design
• Processing
• Characterization

Process Modules Run (as needed)

• Wet/Dry oxidation
• LPCVD nitride growth
• LPCVD polysilicon growth
• RIE nitride and poly etch
• Optical lithography
• Multilevel interconnection
• Any combination of above