Past Projects

Aluminum Etching using Reactive Ion Etch (RIE)

Liftoff Process Using Positive Photoresist

1 Micron feature production in Shipley 1813 photo-resist

Four Point Probe Usage

Electrical Characterization Automation

Thermal Effects on Threshold Voltage

Spin on Glass (SoG)

Interlayer Contact Resistance

Furnace Temperature Profiling

Polysilicon Solid Source Doping Development

DNA Chip

Phosphoric Acid Etch of Silicon Nitride, Nitride Bath Usage Instructions

CMOS Process Step Crosssectional Schematics

MOSFET Process Simulation using TSUPREM-4 and MEDICI

Silicon Oxynitride Depositions by LPCVD

Experiment on Optimum Exposure Times for Different Films