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[Table Adjustment] Georgia Tech Microelectronics Research Center
CMOS as a Research Platform
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 Equipment Instructions

Equipment Instructions
AET RTPKarl Suss Spin CoaterSTS PECVD
AsTEX ECRLFE Barrel EtcherSolitec Spinner
CEE 100CB Spin CoaterLindberg FurnacesTencor Alpha Step Profilometer
CMOS FurnacesNanospec Film Analyzer 3000Tousimis Supercritical Dryer
CVC DC SputtererOlympus Vanox MicroscopeUltratech Plate Cleaner
CVC Electron Beam EvaporatorOzone StripperUnaxis PECVD
CVC Filament EvaporatorPlas-Mos EllipsometerUnifilm Sputterer
CVC RF SputtererPlasma-Therm PECVDVeeco Dektak Profilometer
EFFA Gold Sputter CoaterPlasma-Therm RIE #1Verteq Spin Rinse Dryer
Gasonics Aura 1000 AsherPlasma-Therm RIE #2Woollam Ellipsometer
Hitachi 3500H SEMPlasma-Therm ICPWyko Profilometer
Karl Suss BonderPolaroid Film holderXP-508 Screen Printer
Karl Suss MJB-3 Mask AlignersSCS Spin CoaterKarl Suss MA-6 Mask Aligner
Semitool Spin Rinse Dryer

For training information contact:

James Zhou
training@mirc.gatech.edu
(404) 894-5172
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This page last modified October 16, 2003 17:07.
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